Project Description

Siriusâ„¢ Semiconductor Diffusion Furnaces

PRO 150: 4-stack furnace system for wafers up to 150mm dia.
PRO 200: 3-stack furnace system for wafers up to 200mm dia.
PRO 300: 2-stack furnace system for wafers up to 300mm dia.
PRO 450: 2-stack furnace system for wafers up to 450mm dia.

Custom configurations available

  • Compact—only 4.2 m² (45.9 ft²) in clean room
  • Each tube level microprocessor controlled for functional capability and ease of operation
  • Windows® based operating system for ease of use
  • Host computer with flat screen and keyboard/mouse controls (touch-screen available).
  • Available with atmospheric, LPCVD and PECVD processing capability
  • Film uniformities on many processes comparable with vertical furnaces at less than 1/3 the cost

Additional Technical Info

  • PRO Furnace Systems Brochure
  • Sirius Technical Detail
  • The PECVD Process
  • System Outline Drawing

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SIRIUSâ„¢ Diffusion Furnace Systems are Fully Equipped

Our systems are complete, compact and can be configured to your specific requirements

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Talk With Us About Diffusion Furnaces

Do you have questions about our diffusion furnaces? Would you like to talk with us about your project?

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